產品描述

Equipment introduction

Used to remove metal and photoresist from wafers. The nano-scale high-pressure atomizing nozzle miniaturizes the molecules, so that the liquid can quickly react with the photoresist. Just spin and rinse to remove the metal and photoresist. When the photoresist is dissolved, it will become aerosols, which will float away by centrifugal force. the metal and photoresist strip off the wafer.

The unique patented nozzle can be specially enhanced for the target cleaning area according to different needs and processes.

 

Features