產品描述

Equipment introduction

Suitable for wet etch processes to remove excess film from wafers. The nano-scale atomizing nozzle is equipped with an exclusive patented public rotation technology, which can accelerate the reaction of the potion, effectively control the direction of the potion, save the use of the potion, improve the etching uniformity, productivity, and reduce side erosion.

Multiple chemical liquid nozzles can be provided according to the customer's process requirements, and the liquid supply/acid mixing system can also be designed according to the needs.

 

Features